|POLY.1||50 nm||Minimum width of poly|
|POLY.2||140 nm||Minimum spacing of poly AND active|
|POLY.3||55 nm||Minimum poly extension beyond active|
|POLY.4||70 nm||Minimum enclosure of active around gate|
|POLY.5||50 nm||Minimum spacing of field poly to active|
|POLY.6||75 nm||Minimum Minimum spacing of field poly|
NOTE : POLY.5 rule is for poly lines which interact with any active regions, in other words which are extensions of gate poly lines. If a poly line is used as a print assist feature (which does not interact with any active regions)then minimum spacing of field poly to active is 35nm which is stated in POLY.7 rule.