FreePDK45:Metal Layers

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Metal Layers

Name Pitch (Width/Space) (nm) Thickness (nm) (1) Resistivity (ohm/sq) Permittivity Via dimension (nm) via resistance (ohm) (2)
ILD 9 2000 2.5 800 0.5
Global(9-10) 1600 (800/800) 2000 0.030 (3) 2.5
ILD 7-8 820 2.5 400 1
ThinGlobal (7-8) 800 (400/400) 800 0.075 (3) 2.5
ILD 4-6 290 2.5 140 3
Semi-global 280 (140/140) 280 0.21 2.5
ILD 2-3 120 2.5 70 5
Intermediate (2-3) 140 (70/70) 140 0.25 2.5
ILD 1 120 2.5 65 6
Metal 1 130 (65/65) 130 0.38 2.5
Poly-Dielectric 85 2.5 65 8
Poly 125 (50/75) 85 7.8 2.5


Notes

(1) Thickness calculated from (Pitch/2) * Aspect Ratio, modified with data from reference 2.
(2) In [7], CVD tungsten is assumed to have a resistivity of 20 uOhm-cm (200 Ohm-nm). The contact and via resistances are calculated from the length and width values of each via, assuming this resistivity.
(3) Sheet resistances for global and thin-global metal are extrapolated from the value for semi-global metal, assuming the same material and an increase in thickness.

References

[1] The International Technology Roadmap for Semiconductors (ITRS): Executive Summary, 2005 Edition, p. 5., available online at http://www.itrs.net
[2] V. Arnal et. al., "45 nm Node Multi Level Interconnects with Porous SiOCH Dielectric k=2.5," Proc. of the IEEE International Interconnect Technology Conference (IITC), pp. 213-215, June 5-7 2006.
[3] V. Nguyen et. al., "An AnaIysis of the Effect of Wire Resistance on Circuit Level Performance at the 45-nm Technology Node," Proc. of the IEEE International Interconnect Technology Conference (IITC), pp. 191-193, June 6-8 2005.
[4] S. Narasimha et. al., "High Performance 45-nm SOI Technology with Enhanced Strain, Porous Low-k BEOL, and Immersion Lithography," IEEE International Electron Devices Meeting (IEDM) Technical Digest, Dec. 11-13 2006.
[5] H. Nii et. al., "A 45nm High Performance Bulk Logic Platform Technology (CMOS6) using Ultra High NA(1.07) Immersion Lithography with Hybrid Dual-Damascene Structure and Porous Low-k BEOL," IEEE International Electron Devices Meeting (IEDM) Technical Digest, Dec. 11-13 2006.
[6] N. Oda et. al., "Chip Level Performance Maximization Using ASIS (Application Specific Interconnect Structure) Wiring Design Concept for 45 nm CMOS Devices", IEEE International Electron Devices Meeting (IEDM) Technical Digest, Dec. 5-7 2005.
[7] I. Shao et. al., "An alternative low resistance MOL technology with electroplated rhodium as contact plugs for 32nm CMOS and beyond", IEEE International Interconnect Technology Conference, pp. 102-104, Jun. 4-6 2007.